发明名称 ETCHING LIQUID FOR REMOVING Bi-BASED OXIDE CERAMIC, MANUFACTURE OF INTEGRATED CIRCUIT AND CLEANING OF TOOL USED IN TREATMENT OF Bi-BASED OXIDE CERAMIC
摘要 PROBLEM TO BE SOLVED: To pattern or remove effectively a Bi-based oxide ceramic by a method wherein the Bi-based oxide ceramic is etched with etching chemicals consisting of a fluoride or a nitric acid. SOLUTION: Chemicals consisting of a fluoride in an acid medium is used in a wet etching. The wet etching chemicals contains an F solution in the acid medium consisting of a nitric acid. Various F sources are combined with an NHO3 and can be turned into a nitrate fluoride solution. Such F sources contain HF, and NH4F or NH4HF2, for example. The pH value of a nitrate fluoride etching liquid is lower than about 7 and preferably the pH value is about 5 or lower. Other pH values, such as the pH value of about 3 or lower, the pH value lower than about 0 and the pH value of about 1 or lower, are also preferable. When the acidity of an etching liquid rises, an etching rate is increased. Of cource, the pH value is optimized and a desired etching rate can be achieved for an individual process.
申请公布号 JP2000133642(A) 申请公布日期 2000.05.12
申请号 JP19990183630 申请日期 1999.06.29
申请人 SIEMENS AG 发明人 HINTERMAIER FRANK DR
分类号 H01L21/308;C03C25/68;C04B41/53;C09K13/04;C09K13/08;H01L21/02;H01L21/311;H01L21/8246;(IPC1-7):H01L21/308 主分类号 H01L21/308
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