A method of forming a pattern comprising: (1) depositing an energy-sensitive layer on the surface of a resin layer for formation of an insulating film, (2) emitting an active energy beam or heat wave directly or through a mask to obtain a desired pattern, (3) developing the energy-sensitive layer to form a resist pattern of the energy-sensitive layer, and (4) removing the resin layer by a further development process to obtain the desired pattern.
