发明名称 |
SOLUTION FOR FORMING SILICA COATING FILM, PROCESS FOR PRODUCING THE SAME, AND SILICA COATING FILM AND PROCESS FOR PRODUCING THE SAME |
摘要 |
A solution for silica coating film formation which comprises an organic solvent and a chlorosiloxane compound and can have excellent reactivity with substrates. When the solution is applied to a substrate surface in a dry atmosphere and the coated substrate is exposed to an atmosphere containing moisture, then a silica coating film excellent in durability, etc. can be produced without the need of catalyst addition or heat treatment. By adding fine anhydrous silica particles to the solution, a solution capable of viscosity control and having excellent coating film properties can be provided. When the resultant solution is applied to a substrate surface in a dry atmosphere and the coated substrate is exposed to an atmosphere containing moisture, a thick silica coating film excellent in durability, etc. can be formed without the need of catalyst addition or heat treatment. Therefore, the invention is of great industrial importance.
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申请公布号 |
WO0026311(A1) |
申请公布日期 |
2000.05.11 |
申请号 |
WO1999JP06143 |
申请日期 |
1999.11.04 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.;OGAWA, KAZUFUMI;TAKEBE, TAKAKO;OTAKE, TADASHI;NOMURA, TAKAIKI |
发明人 |
OGAWA, KAZUFUMI;TAKEBE, TAKAKO;OTAKE, TADASHI;NOMURA, TAKAIKI |
分类号 |
C09D183/02;H01L21/312;H01L21/316;(IPC1-7):C09D183/02;C09J183/02;G02F1/136 |
主分类号 |
C09D183/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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