| 摘要 |
<p>A solution for silica coating film formation which comprises an organic solvent and a chlorosiloxane compound and can have excellent reactivity with substrates. When the solution is applied to a substrate surface in a dry atmosphere and the coated substrate is exposed to an atmosphere containing moisture, then a silica coating film excellent in durability, etc. can be produced without the need of catalyst addition or heat treatment. By adding fine anhydrous silica particles to the solution, a solution capable of viscosity control and having excellent coating film properties can be provided. When the resultant solution is applied to a substrate surface in a dry atmosphere and the coated substrate is exposed to an atmosphere containing moisture, a thick silica coating film excellent in durability, etc. can be formed without the need of catalyst addition or heat treatment. Therefore, the invention is of great industrial importance.</p> |
