Low resistance thin film, especially a transparent conductive electrode for a display or solar cell, is arc discharge ion plated using h.f. bias voltage application to the anode or cathode

摘要

Arc discharge ion plating of a low resistance thin film, comprises h.f. bias voltage application to an anode (7) or a cathode (2). An Independent claim is also included for an arc discharge ion plating unit for carrying out the above process. Preferred Features: A variable r.f. or h.f. bias is applied to an electrode (7) near the source material (15) to be evaporated.