发明名称 MASK FOR VAPOR DEPOSITION
摘要 PROBLEM TO BE SOLVED: To obtain a mask for vapor deposition having a simple structure and enabling the precise formation of a thin film such as a transparent electrode. SOLUTION: The mask for vapor deposition has striped openings 20 for forming a transparent electrode on the surface of a transparent substrate of glass, a resin or the like with a transparent electrode material such as ITO so that the electrode is made striped at a prescribed pitch and has reinforcing bodies 26 which prevent the slack of the mask on the mask forming parts each between the openings 20.
申请公布号 JP2000129419(A) 申请公布日期 2000.05.09
申请号 JP19980301293 申请日期 1998.10.22
申请人 HOKURIKU ELECTRIC IND CO LTD 发明人 WAKABAYASHI MORIMITSU;MIYAMA NOBUYUKI;FUKUMOTO SHIGERU;TANPO TETSUYA
分类号 H05B33/10;C23C14/04;(IPC1-7):C23C14/04 主分类号 H05B33/10
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