发明名称 |
Laser irradiation system and application thereof |
摘要 |
Dispersion of energy density in the longitudinal direction of excimer laser shaped into a linear beam is corrected. A gas introducing system which extends in the longitudinal direction of an oscillator and which is provided with a large number of gas injecting holes is provided within the oscillator. It allows to suppress dispersion of laser oscillating positions and to suppress the dispersion of irradiation energy density within the linear laser beam.
|
申请公布号 |
US6061375(A) |
申请公布日期 |
2000.05.09 |
申请号 |
US19970961812 |
申请日期 |
1997.10.31 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY, INC. |
发明人 |
ZHANG, HONGYONG;YAMAZAKI, SHUNPEI |
分类号 |
H01L21/268;B23K26/06;H01S3/03;H01S3/036;H01S3/225;(IPC1-7):H01S3/22 |
主分类号 |
H01L21/268 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|