发明名称 Laser irradiation system and application thereof
摘要 Dispersion of energy density in the longitudinal direction of excimer laser shaped into a linear beam is corrected. A gas introducing system which extends in the longitudinal direction of an oscillator and which is provided with a large number of gas injecting holes is provided within the oscillator. It allows to suppress dispersion of laser oscillating positions and to suppress the dispersion of irradiation energy density within the linear laser beam.
申请公布号 US6061375(A) 申请公布日期 2000.05.09
申请号 US19970961812 申请日期 1997.10.31
申请人 SEMICONDUCTOR ENERGY LABORATORY, INC. 发明人 ZHANG, HONGYONG;YAMAZAKI, SHUNPEI
分类号 H01L21/268;B23K26/06;H01S3/03;H01S3/036;H01S3/225;(IPC1-7):H01S3/22 主分类号 H01L21/268
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