发明名称 STRONTIUM RUTHENATE SINTERED COMPACT, ITS PRODUCTION AND SPUTTERING TARGET USING THE SAME
摘要 PROBLEM TO BE SOLVED: To obtain a dielectric film good for use in a sputtering target by providing a specific value or above of density and regulating the amount of Sr within a specified range expressed in terms of molar ratio based on Ru. SOLUTION: This sintered compact has >=3.5 g/cm3 density and the amount of Sr is 1.1 to 1.3 times expressed in terms of molar ratio based on Ru. The sintered compact is produced by mixing 40-70% of strontium carbonate with 60-30% of ruthenium oxide expressed in terms of weight ratio and then passing the resultant mixture through a calcining and a baking steps. The calcination is preferably carried out at 1,100-1,400 deg.C. Water and an organic binder are added to the resultant calcined powder to provide a slurrylike state. The obtained slurry is mixed and then spray-dried. The powder is subsequently formed with a metal mold forming method, a cold isostatic pressing method, etc., by taking the shape, size, etc., of the sintered compact into consideration. The forming pressure is preferably >=1.0 t/cm2. The baking of the formed compact is preferably performed at 1,500-1,700 deg.C. At this time, a baking jig made of zirconia or a spinel is preferably used as the baking jig.
申请公布号 JP2000128638(A) 申请公布日期 2000.05.09
申请号 JP19980310197 申请日期 1998.10.30
申请人 KYOCERA CORP 发明人 TAKAHASHI DAISUKE;NOGUCHI YUKIO;SUZUKI HIDESHI
分类号 C04B35/00;C01G55/00;C04B35/495;C23C14/34;H01B3/12 主分类号 C04B35/00
代理机构 代理人
主权项
地址