发明名称 ELECTROLESS PLATING HOLDER AND ELECTROLESS PLATING METHOD
摘要 PROBLEM TO BE SOLVED: To provide an electroless plating holder and electroless plating method by which the contacts and collisions of ceramic element assemblies with one another are prevented so that the ceramic assemblies are never cracked or broken. SOLUTION: Electroless plating is conducted by using an electroless plating holder 1 provided with plural cells 10 for separately housing plural ceramic element assemblies 2. The holder 1 is rotated or oscillated in a plating tank around a shaft 16 to promote the movement of the assemblies 2 in the cells 10 so that a more uniform plating film is deposited.
申请公布号 JP2000129451(A) 申请公布日期 2000.05.09
申请号 JP19980297875 申请日期 1998.10.20
申请人 MURATA MFG CO LTD 发明人 FURUBAYASHI MIKIYA;TAKANO YOSHIHIKO;SASAKI KIYOMI;UKAI HIROYUKI;HOSOMI HIDEJI;IMAMURA AKIRA
分类号 C23C18/31;B05C13/02;C23C18/16;(IPC1-7):C23C18/31 主分类号 C23C18/31
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