Optical exposure systems and processes for alignment of liquid crystals

摘要

The invention relates to an optical exposure system with partial polarization and collimation components that is useful for exposing alignment layers with light in order to align liquid crystals. The exposure system comprises at least one source of optical radiation, means for partially collimating said optical radiation, means for partially polarizing said optical radiation and means for transporting the substrate and radiation relative to one another. Other embodiments further comprise means for partially filtering the optical radiation and means for some portion of said optical radiation to be incident at an oblique angle relative to said substrate. Other embodiments include processes for aligning liquid crystals using the optical exposure systems.