发明名称 |
PRODUCTION OF OXIDE THIN FILM |
摘要 |
PROBLEM TO BE SOLVED: To provide a process for producing a oxide thin film having a uniform thickness. SOLUTION: This process consists in adding a fluorine capturing agent into an aqueous solution containing a fluorometal complex compound and depositing the metal oxide thin film derived from the fluorometal complex compound on a base material immersed into the aqueous solution, in which the deposition of the metal oxide thin film is executed while part of the aqueous solution is continuously or intermittently filtered in the presence of the seed crystal of the metal oxide.
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申请公布号 |
JP2000128509(A) |
申请公布日期 |
2000.05.09 |
申请号 |
JP19980308214 |
申请日期 |
1998.10.29 |
申请人 |
HOYA CORP |
发明人 |
CHIYOU KAIKA;SATO KOJI;MIURA TOSHINOBU |
分类号 |
B32B9/00;C01B13/32;C01G23/04;C03C17/25;(IPC1-7):C01B13/32 |
主分类号 |
B32B9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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