| 摘要 |
A fire protection system for a clean room semiconductor fabrication facility involves the use of a low pressure carbon dioxide source and a discharge system to extinguish fires detected in or near the tools. Each tool is plumbed with dedicated carbon dioxide suppression agent discharge plumbing. The system individually monitors each tool for fire, preferably using infrared radiation sensors and linear heat detection cable. A remote control panel responsive to the fire detectors controls the discharge of carbon dioxide suppression agent unless there is operator intervention. A user interface at or near the respective tool includes various manually actuated controls to override the automatic operation of the fire protection system, and therefore allow a supervisor to eliminate or at least minimize the amount of clean up, repairs and downtime associated with the discharge of carbon dioxide suppression agent in case of a false alarm. The components of the fire protection system (e.g. detectors, plumbing, discharge nozzles) are especially protected against chemical corrosion not only to maintain the performance of the fire protection system over time, but also to avoid the generation of particulates that could possibly pollute the clean room environment and adversely affect the semiconductor manufacturing environment.
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