发明名称 |
Positive-working photosensitive composition |
摘要 |
The present invention provides a positive-working photosensitive composition which comprises (a) a basic nitrogen-containing compound having a polycyclic structure represented by formula (I) and (b) at least one of compounds represented by formulae (II) to (IV) defined in the specification: wherein Y and Z may be the same or different and each represent a straight-chain, branched or cyclic alkylene group, which may contain a hetero atom or may be substituted. The positive-working photosensitive composition which exhibits no reduction of width of resist pattern or no T-top deformation of surface shape of resist pattern with time between after exposure and heat treatment without causing sensitivity drop.
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申请公布号 |
US6060213(A) |
申请公布日期 |
2000.05.09 |
申请号 |
US19990270516 |
申请日期 |
1999.03.17 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
KODAMA, KUNIHIKO |
分类号 |
G03F7/004;G03F7/039;(IPC1-7):G03C1/73;G03C1/72 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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