METHOD AND APPARATUS FOR FORMING THIN FUNCTIONAL FILM

摘要

There is provided a method of forming a thin functional film by vacuum vapor deposition in which a functional material is heated from the above thereof so that bumping or splashing of the functional material is not caused upon evaporation of the functional material. Concretely, the functional material (7) is placed in a receiving vessel (8) and the functional material is heated by a heater (9) which is located above the functional material so that bumping or splashing is suppressed, whereby a uniform functional film is produced without a pinhole. <IMAGE>