发明名称 Gas supply path structure, gas supply method, laser oscillating apparatus, exposure apparatus, and device production method
摘要 <p>A gas supply path structure forms a fluid path for allowing a laser gas to flow into or out of a pair of fluid inlet and outlet 11a and a laser gas is controlled to a predetermined subsonic speed at a throat portion. Gas supplies for controlling the speed of the gas are connected each to the fluid inlet and to the fluid outlet of the gas supply path structure and, together with a cooling device, compose a circulation system for controlling the speed and pressure of the laser gas at the fluid inlet and/or at the fluid outlet. &lt;IMAGE&gt;</p>
申请公布号 EP0997225(A1) 申请公布日期 2000.05.03
申请号 EP19990308543 申请日期 1999.10.28
申请人 TADAHIRO OHMI;CANON KABUSHIKI KAISHA 发明人 OHMI, TADAHIRO;OSAWA, HIROSHI;INO, KAZUHIDE;SHIRAI, YASUYUKI;TANAKA, NOBUYOSHI;SHINOHARA, TOSHIKUNI;HIRAYAMA, MASAKI
分类号 H01S5/30;H01S3/036;(IPC1-7):B23K26/00 主分类号 H01S5/30
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