| 发明名称 |
Controlled amine poisoning for reduced shrinkage of features formed in photoresist |
| 摘要 |
A process for reducing shrinkage of photolithographic features formed in a photoresist including exposing the photoresist to at least one material selected from the group consisting of at least one amine, at least one amide, at least one aldehyde, and nitrogen.
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| 申请公布号 |
US6057084(A) |
申请公布日期 |
2000.05.02 |
| 申请号 |
US19970943623 |
申请日期 |
1997.10.03 |
| 申请人 |
FUSION SYSTEMS CORPORATION |
发明人 |
MOHONDRO, ROBERT DOUGLAS |
| 分类号 |
G03F7/039;G03F7/004;G03F7/40;H01L21/027;(IPC1-7):G03F7/00 |
主分类号 |
G03F7/039 |
| 代理机构 |
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