发明名称 |
Apparatus and method for white powder reduction in silicon nitride deposition using remote plasma source cleaning technology |
摘要 |
An apparatus and method for reducing the production of white powder in a process chamber used for depositing silicon nitride. Steps of the method include heating at least a portion of a wall of the process chamber; providing a liner covering a substantial portion of a wall of the process chamber; providing a remote chamber connected to the interior of the process chamber; causing a plasma of cleaning gas in the remote chamber; and flowing a portion of the plasma of cleaning gas into the process chamber. The apparatus includes a deposition chamber having walls; means for heating the walls, the means thermally coupled to the walls; a liner covering a substantial portion of the walls; a remote chamber disposed outside of the chamber; an activation source adapted to deliver energy into the remote chamber; a first conduit for flowing a precursor gas from a remote gas supply into the remote chamber where it is activated by the activation source to form a reactive species; and a second conduit for flowing the reactive species from the remote chamber into the deposition chamber.
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申请公布号 |
US6055927(A) |
申请公布日期 |
2000.05.02 |
申请号 |
US19970782169 |
申请日期 |
1997.01.14 |
申请人 |
APPLIED KOMATSU TECHNOLOGY, INC. |
发明人 |
SHANG, QUANYUAN;ROBERTSON, ROBERT MCCORMICK;LAW, KAM S.;MAYDAN, DAN |
分类号 |
B08B7/00;C23C16/42;C23C16/44;C23C16/52;H01L21/205;H01L21/3065;H01L21/31;(IPC1-7):C23C16/00 |
主分类号 |
B08B7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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