发明名称 |
Process for manufacturing semiconductor integrated circuit device |
摘要 |
In order that reaction products of low vapor pressure may be prevented from being deposited on the side wall of a predetermined pattern when this pattern is to be formed by dry-etching a Pt film or a PZT film, a resist mask 54 having a rounded outer periphery at its head is used when the Pt film 53 deposited on a semiconductor substrate 50 is to be dry-etched. After this dry-etching, moreover, an overetching of a proper extent is performed to completely remove the side wall deposited film 55 which is left on the side of the pattern. The resist mask 54 is formed by exposing and developing a benzophenone novolak resist and subsequently by heating to set it while irradiating it, if necessary, with ultraviolet rays.
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申请公布号 |
US6057081(A) |
申请公布日期 |
2000.05.02 |
申请号 |
US19970935033 |
申请日期 |
1997.09.22 |
申请人 |
HITACHI, LTD. |
发明人 |
YUNOGAMI, TAKASHI;SASABE, SHUNJI;SUKO, KAZUYUKI;ABE, JUN;KUMIHASHI, TAKAO;MURAI, FUMIO |
分类号 |
G03F7/26;G03F7/40;H01L21/02;H01L21/027;H01L21/302;H01L21/3065;H01L21/311;H01L21/3213;H01L21/822;H01L21/8242;H01L27/04;H01L27/10;H01L27/108;(IPC1-7):G03F7/26 |
主分类号 |
G03F7/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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