发明名称 Crt beam landing spot size correction apparatus and method
摘要 A 90 percent electron gun aperture astigmatism is used in conjunction with a four-pole electromagnet to make a CRT electron beam just focus point and minimum beam width occur closer to the same focus voltage. A single grid may have the 90 percent astigmatism, or astigmatisms in two or more grids may combine to produce an effective 90 percent astigmatism. A four-pole electromagnet is positioned around the focusing grid and current driving the electromagnet is varied with beam position during normal operation.
申请公布号 AU1313500(A) 申请公布日期 2000.05.01
申请号 AU20000013135 申请日期 1999.10.14
申请人 SONY ELECTRONICS INC. 发明人 TOSHIYUKI OGURA
分类号 H01J29/50;H01J29/56;H01J29/66;H01J29/70 主分类号 H01J29/50
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