发明名称 VACUUM CHAMBER FOR DEPOSITION
摘要 PURPOSE: A multipurpose vacuum chamber for deposition is provided to improve the quality of a thin film by forming a rotary circle including a target holder, a substrate holder, and a gauge for measuring a thickness of a thin film located on a concentric circle. CONSTITUTION: A lock chamber(5) is connected directly to a vacuum chamber(4) in order to prevent the pollution of the vacuum chamber(4) from evaporated organic molecules by using an exhaust pump. The vacuum chamber(4) is combined with a flange(4a) in order to adhere an evaporator to a lower end of the vacuum chamber(4). A target holder(6), a substrate holder(7), a gauge for measuring a thickness of a thin film(8), and an optical glass(9) are located on a concentric circle of a rotary axis of a rotary circle(1).
申请公布号 KR100250211(B1) 申请公布日期 2000.05.01
申请号 KR19950056119 申请日期 1995.12.26
申请人 POHANG IRON & STEEL CO.,LTD;POHANG RESEARCH INSTITUTE OF INDUSTRIAL SCIENCE & TECHNOLOGY 发明人 KIM, CHAN-UK;YANG, CHUNG-JIN;SON, YOUNG-KEUN
分类号 H01L21/08;(IPC1-7):H01L21/08 主分类号 H01L21/08
代理机构 代理人
主权项
地址