发明名称 |
VACUUM CHAMBER FOR DEPOSITION |
摘要 |
PURPOSE: A multipurpose vacuum chamber for deposition is provided to improve the quality of a thin film by forming a rotary circle including a target holder, a substrate holder, and a gauge for measuring a thickness of a thin film located on a concentric circle. CONSTITUTION: A lock chamber(5) is connected directly to a vacuum chamber(4) in order to prevent the pollution of the vacuum chamber(4) from evaporated organic molecules by using an exhaust pump. The vacuum chamber(4) is combined with a flange(4a) in order to adhere an evaporator to a lower end of the vacuum chamber(4). A target holder(6), a substrate holder(7), a gauge for measuring a thickness of a thin film(8), and an optical glass(9) are located on a concentric circle of a rotary axis of a rotary circle(1).
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申请公布号 |
KR100250211(B1) |
申请公布日期 |
2000.05.01 |
申请号 |
KR19950056119 |
申请日期 |
1995.12.26 |
申请人 |
POHANG IRON & STEEL CO.,LTD;POHANG RESEARCH INSTITUTE OF INDUSTRIAL SCIENCE & TECHNOLOGY |
发明人 |
KIM, CHAN-UK;YANG, CHUNG-JIN;SON, YOUNG-KEUN |
分类号 |
H01L21/08;(IPC1-7):H01L21/08 |
主分类号 |
H01L21/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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