| 摘要 |
PURPOSE: A method of fabricating spacer for flat display device is provided to be easy to fabricate and to have a large aspect ratio and a fine line width, by using thick photoresist film and spin on glass(SOG) film. CONSTITUTION: A photoresist film(11) is formed on a prepared substrate(10) so as to have a thickness corresponding to a spacer height using a photoresist capable of forming a thick film. A mask with a pattern corresponding to the spacer pattern is aligned over an exact position of the photoresist film using an alignment equipment and an exposure process is carried out. After removing the mask, the exposed photoresist film(11) is developed so that a photoresist corresponding to the spacer pattern may be removed. An SOG film is formed on the photoresist film. The SOG film is processed by a chemical mechanical polishing method so as to remain at the spacer pattern in the photoresist film(11). A spacer made of the SOG material is formed on the substrate(10) by removing the photoresist film.
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