发明名称 Electrodeposition of metals in small recesses using modulated electric fields
摘要 A layer of a metal is electroplated onto an electrically conducting substrate having a generally smooth surface with a small recess therein, having a transverse dimension not greater than about 350 micrometers, by immersing the substrate and a counterelectrode in an electroplating bath of the metal to be electroplated and passing a modulated reversing electric current between the electrodes. The current contains pulses that are cathodic with respect to said substrate and pulses that are anodic with respect to said substrate. The cathodic pulses have a duty cycle less than about 50% and said anodic pulses have a duty cycle greater than about 50%, the charge transfer ratio of the cathodic pulses to the anodic pulses is greater than one, and the frequency of said pulses ranges from about 10 Hertz to about 12000 Hertz. The plating bath may be substantially devoid of levelers and/or brighteners.
申请公布号 AU1444300(A) 申请公布日期 2000.05.01
申请号 AU20000014443 申请日期 1999.10.14
申请人 FARADAY TECHNOLOGY, INC. 发明人 E. JENNINGS TAYLOR;JENNY J. SUN;CHENGDONG ZHOU
分类号 C25D5/18;C25D7/12;H01L21/288;H01L21/768;H05K3/42 主分类号 C25D5/18
代理机构 代理人
主权项
地址