发明名称 TMA USING AIN AND MANUFACTURING METHOD THEREOF
摘要 PURPOSE: A thin film type optical path adjusting device using an aluminium nitride(AIN) and a method for manufacturing the same are provided to simplify a process of manufacturing an actuator and prevent a driving substrate from being damaged by using AIN material and a low temperature process. CONSTITUTION: A protective layer(110) is formed on a substrate(100) having transistors and a drain pad(105) to prevent the substrate(100) from being damaged. An etching preventing layer(115) made of nitride is formed on the protective layer(110) to prevent the substrate(100) and the protective layer(110) from being damaged by an etching process. A sacrificial layer is formed on the etching preventing layer(115). A surface of the sacrificial layer is made flat by using a spin on glass or a chemical mechanical polishing method. A supporting unit of an actuator(160) is formed with partly exposing the etching preventing layer(115).
申请公布号 KR100255749(B1) 申请公布日期 2000.05.01
申请号 KR19970042089 申请日期 1997.08.28
申请人 DAEWOO ELECTRONICS CO.,LTD 发明人 KIM, HONG-SUNG
分类号 G02F1/015;(IPC1-7):G02F1/015 主分类号 G02F1/015
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