| 摘要 |
PROBLEM TO BE SOLVED: To provide a part-batch pattern forming method where a pattern can be transferred with strict dimensional accuracy. SOLUTION: A part-batch pattern 34 for charged particle beam drawing is formed resting on circuit design data through this method. When a part-batch pattern 34 is formed on the basis of circuit design data, an interlayer calculation is carried out between circuit design data on a drawing target layer and circuit design data on a base layer under the drawing target layer, and a step in which an integrated pattern 24 is extracted and another step in which data on a part- batch pattern are formed for making an integrated pattern serve as a target region are provided.
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