| 摘要 |
PROBLEM TO BE SOLVED: To form a film thickness of an insulating layer thin and to improve the insulation characteristic between conductor films by irradiating a high- polymer material, such as a photoresist, with UV light just prior to the formation of an insulating film, by hard curing of the high-polymer material. SOLUTION: The manufacture of this thin-film magnetic head 1 is executed by first forming the insulating layer 3 on a nonmagnetic substrate 2, laminating a lower layer shield 4 thereon and forming the same to a prescribed shape. Next, a reproducing lower layer gap 5 which is the nonmagnetic insulating film is then laminated on the lower layer shield 4 and an MR element 6 which is the conductor film is deposited thereon. The photoresist is applied on the inclined side surface at the rear end 4b of the lower layer shield 4 and is irradiated with the UV light. The photoresist irradiated with the UV light is thereafter subjected to hard curing, by which a cured film 11 is formed. The cured film 11 is made smaller in the film thickness and the inclination thereof is made gentle by irradiating the high-polymer material, such as the photoresist applied thereon, with the UV light.
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