发明名称 MICROMACHINE AND MANUFACTURE OF MICROMACHINE, AND SPATIAL OPTICAL MODULATING DEVICE AND MANUFACTURE OF SPATIAL OPTICAL MODULATING DEVICE
摘要 PROBLEM TO BE SOLVED: To improve the productivity by easily forming a complicated shape with good reproducibility not through a complicated process by forming a 2nd structure on a 1st structure by pattern transfer. SOLUTION: On a driving part 140 as the 1st structure which is movable, a microprism as the 2nd structure is formed by pattern transfer. In this case the 1st structure which is movable is formed on a silicon substrate by a method such as a silicon process wherein a photolithography process, dry etching, wet etching, oxide film formation, crystal growth, a CMP flattening process, etc., are combined, laser machining, sol-gel formation, sintering, machine cutting, etc. The 2nd structure can be formed on the 1st structure by pattern transfer by applying resin over the 1st structure which is previously formed and applying a pattern for forming the 2nd structure.
申请公布号 JP2000121966(A) 申请公布日期 2000.04.28
申请号 JP19980291218 申请日期 1998.10.13
申请人 SEIKO EPSON CORP 发明人 UEJIMA SHUNJI;YONEKUBO MASATOSHI;TAKEDA TAKASHI;NISHIKAWA HISAO
分类号 G02B26/08;B62D57/00;B81B3/00;B81B7/04;B81C1/00;B81C3/00;B81C99/00;(IPC1-7):G02B26/08 主分类号 G02B26/08
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