| 摘要 |
PROBLEM TO BE SOLVED: To surely decide which of an illuminating optical system or a reduction imaging optical system should be adjusted. SOLUTION: This adjustment method includes a step S1, where the same transfer pattern is transferred to plural parts in the exposed region of a photoresist film, a step S2 where CD dimensional dispersion of a transfer pattern and dispersion in the exposure margin in an exposed region are calculated, a first decision step S5 where it is decided that an illuminating optical system and a reduction imaging system are not required to be adjusted, when a CD dimensional dispersion is smaller than that of a first prescribed % (10%), a second deciding step S7, where it is decided that an illuminating optical system has an errorσto correct, when the CD dimensional dispersion is larger than the first prescribed % and the dispersion of an exposure margin is smaller than a second prescribed % (10%), and a third deciding step S6, where it is decided that a reduction imaging optical system has lens aberration to be corrected, when the CD dimensional dispersion is larger than the first prescribed % and the dispersion of an exposure margin is also larger than a second prescribed percentage (10%).
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