| 摘要 |
PROBLEM TO BE SOLVED: To avoid the generation of a difference in the dimension of a resist pattern without depending on whether the mask pattern is coarse or dense, by incorporating a specified base resin, a photoacid producing agent and a dissolution accelerating agent consisting of a specified polymer resin. SOLUTION: This resist material contains a base resin expressed by formula I, a photoacid producing agent and a dissolution accelerating agent consisting of a polymer resin. The polymer resin is alkali-soluble and is included by 0.1 to 15 wt.% to the base resin with 0% protecting rate, and has 5,000 to 20,000 mol.wt. In the formula I, R is a protecting group expressed by formula II or the like and m and n are natural numbers. Since the dissolving rate in the resist in an exposed part and on the interface of the unexposed part is faster in a coarse pattern that in a dense fine pattern, only the dissolving rate in the dense pattern is increased by adding the dissolution accelerating agent to the resist material. Therefore, by increasing the rate only in a dense pattern, difference in the dissolving rate between a dense pattern and a coarse pattern can be eliminated. |
