| 摘要 |
PROBLEM TO BE SOLVED: To provide a new photosensitive composition capable of always synthesizing a uniform alkali-soluble polyurethane and having high sensitivity, excellent in developability, excellent also in under-developability to an exhausted developer or the like and also having high printing durability by incorporating an alkali-soluble polyurethane. SOLUTION: The photosensitive composition contains an o-quinonediazido compound and the alkali-soluble polyurethane. The alkali-soluble polyurethane is obtained by allowing unsaturated double bond parts in a urethane structure that is a reaction product of a diol compound having an unsaturated double bond and diisocyanate compound to react with a thiol compound having a carboxyl group. |
