| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure method and an aligner, where even a complicated lithographic pattern in which a dense pattern and a coarse pattern are mixedly present in the same shot can be controlled accurately in dimensions. SOLUTION: A size change of a pattern, when an exposure is changed, is obtained for plural patterns in a shot, and an exposure in a shot is determined on the basis of a relationship between the size change of a pattern and the amount of change in exposure. That is, optimal exposures for a logic pattern and a DRAM pattern are averaged for target dimensions, or an optimal exposure amount E of small exposure latitude in a shot is determined through weighting the logic pattern.
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