| 摘要 |
PROBLEM TO BE SOLVED: To obtain a defect inspection apparatus which reduces a comparison dislocation due to magnification error on the face of a photodetector caused by the lens distortion and a mounting error of an image-formation lens or by the inclination or the like of a substrate. SOLUTION: A pattern on a substrate is image-formed on a CCD photodetector 11 via a lens system. An image-data supply means supplies a series of first image data on the basis of a signal from the CCD photodetector 11. A delay means 14 delays the first image data by a portion of the number of pixels corresponding to the delay data. In a subpixel correction memory 15, a subpixel-correction processing operation, which is based on a phase-shift data corresponding to a phase shift between pitches is executed to the first image data and second image data, and third image data and fourth image data are output. In a data supply means, delay data and phase shift data in which the first image data supplied from the image-data supply means is corrected according as whether the formed image on the photodetector 11 is an image corresponding to which region of the lens system are supplied to the delay means and the subpixel correction means 15. Then, a defect detection means 17 detects a defect of the pattern on the basis of the difference image between the third image data and the fourth image data. |
