发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURE THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device equipped with a capacitor excellent in electric properties and a manufacturing method thereof. SOLUTION: A manufacturing method includes a first process where a lower electrode 30 is formed on a base board 10; a second process where a tantalum oxide film 32 is formed on the lower electrode 30; a third process where the base board 10 is kept at a temperature of above 400 deg.C, an ozone-containing oxidizing atmosphere is irradiated with ultraviolet rays, and the tantalum oxide film 32 is oxidized; a fourth process where the tantalum oxide film 32 is crystallized in an oxygen-containing oxidizing atmosphere; and a fifth process where an upper electrode 34 is formed on the tantalum oxide film 32.
申请公布号 JP2000124417(A) 申请公布日期 2000.04.28
申请号 JP19980292353 申请日期 1998.10.14
申请人 FUJITSU LTD 发明人 TAKAGI NORIMITSU
分类号 H01L27/04;H01L21/285;H01L21/316;H01L21/822;H01L21/8242;H01L27/108 主分类号 H01L27/04
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