| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a thin film magnetic head which can improve operation efficiency of an etching device and number of the thin film magnetic heads capable of being manufactured per unit time by suppressing heaping of a deposit. SOLUTION: In this manufacturing method, a substrate K is mounted on a mounting bed 9, insides of a generating room 4 and a processing room 5 are evacuated so that pressure is >=1 to <=20 mTorr by exhausting air from an exhaust port 8 and, then, BCl3 and gaseous chlorine are introduced into the processing room 5 and the generating room 4 from a gas introducing pipe 7 while being mixed so that flow ratio of the gaseous BCl3 to total gaseous flow rate is >=30% to <=80%. Microwave is introduced from a wave-guide tube 12 into the generating room 4 and, at the same time, a prescribed magnetic field is formed in the generating room 4 by an exciting coil 15. Thereby the gaseous mixture is ECR-excited to generate plasma and the generated plasma is introduced onto the substrate K in the processing room 5 to etch the substrate K.
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