发明名称 MANUFACTURE OF SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To obtain a method of manufacturing a semiconductor device which can increase inspection reliability and efficiency by removing the biased wear caused by friction on the probe needles used for inspection. SOLUTION: In this manufacturing method for simultaneously inspecting a plurality of chip parts 11 of a semiconductor wafer as semiconductor chips to be later formed by separating them with the use of probe needles 20, when the inspecting probe needles 20 are brought into contact with electrode pads 11a of the chip parts 11, a passivation film 26 is opened so that the needles do not abut against the passivation film at preset positions, where the probe needles 20a are to abut against broken chip parts 12 in the periphery of the wafer.
申请公布号 JP2000124277(A) 申请公布日期 2000.04.28
申请号 JP19980290781 申请日期 1998.10.13
申请人 TOSHIBA CORP 发明人 KUSANO TATSUYA;TSURU TAKESHI;YOSHIDA TORU
分类号 H01L21/66;(IPC1-7):H01L21/66 主分类号 H01L21/66
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