发明名称 TFT ELEMENT WITH HIGH ENERGY GAP OFF SET LAYER STRUCTURE
摘要 <p>PROBLEM TO BE SOLVED: To obtain a TFT element with a high energy gap off set layer structure which can improve quality of LCD screen. SOLUTION: An effect to improve screen quality of an LCD greatly is obtained by raising ON/OFF current ratio of an element by providing a TFT element (hereinafter abbreviated to an upper gate electrode TFT element) with a low-high energy gap semiconductor layer structure and a gate electrode 10 in an upper layer, making a low energy gap semiconductor layer a channel layer 30 of conduction carrier, preventing tunnel phenomenon from energy band wherein conduction carrier is generated to energy band by a high energy gap off-set layer, and reducing gate induced drain leakage current.</p>
申请公布号 JP2000124456(A) 申请公布日期 2000.04.28
申请号 JP19980289490 申请日期 1998.10.12
申请人 SHOKA KAGI KOFUN YUGENKOSHI;JIAOTONG UNIV 发明人 CHO SHUNGEN
分类号 H01L29/786;G02F1/136;G02F1/1368;G09F9/35;H01L21/336;(IPC1-7):H01L29/786 主分类号 H01L29/786
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