| 摘要 |
PROBLEM TO BE SOLVED: To accurately and stably evaluate by Fourier series expanding measured space images, using not only the primary coefficients but also necessary secondary or higher coefficients and calculating position shift quantity. SOLUTION: A half mirror 6 is inserted between an opening stop 5 and a front group of relay lens system 7 and the light partly reflected by the mirror is condensed with a condenser lens 13 and goes in an exposure quantity monitor. A projection optical system 15 consists of a plurality of lenses, for example, which focused a pattern drawn on a mask M with a certain magnification on a wafer put on a wafer stage 16. That is, for measuring the exposure coordinate on the wafer, a wafer stage interferometer is provided. By two- dimensionally driving and controlling wafers on the X-Y plane and exposing by projection in this manner, transfer patterns of mask M can be exposed in each exposure region of the wafer W. Also the space image can be evaluated in closer form to resist image than the phase detection evaluation of only primary component of Fourier series expansion. |
