发明名称 DEVELOPING SOLUTION DISCHARGE NOZZLE FOR RESIST DEVELOPING APPARATUS
摘要 PROBLEM TO BE SOLVED: To prevent developer from containing air bubbles and dripping off from a nozzle even if wafer is larger than 12 inches (30 cm) in diameter, when developing solution is sprayed on the wafer, thus improving product yield. SOLUTION: A developer discharge nozzle has a structure, where a large number of hollow fibers 6 each having a large number of fine holes on its outer surface, prescribed in length, and very fine in inner diameter are bound into a bundle providing a space between them, and the bundle is housed and fixed in a housing 8. A developer, fed from a developing solution supply source, is introduced into spaces which are demarcated inside the housing 8 and discharged out of the housing 8 passing through the hollow fibers 8 via the fine holes bored in their outer surfaces, where flows of developer are bound into a bundle and spread concentrically in a laminar flow from the center to the periphery of a wafer so as to be discharged through a single hollow nozzle, despite the developer being discharged out through a large number of hollow fibers.
申请公布号 JP2000124126(A) 申请公布日期 2000.04.28
申请号 JP19990038091 申请日期 1999.02.17
申请人 ISHIKAWA SEISAKUSHO LTD;NIKKISO CO LTD 发明人 MITANI TADAOKI;HORI HIDENOBU;NIKI TOSHIICHI;CHIBA TOSHIAKI
分类号 B05C11/08;G03F7/30;H01L21/027;(IPC1-7):H01L21/027 主分类号 B05C11/08
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