| 摘要 |
PROBLEM TO BE SOLVED: To perform surface processing with a substrate in a process vessel containing a washing liquid in a clean atmosphere, by confining a loader part and unloader part, and a surface processing part and transfer cassette buffer part in a housing. SOLUTION: At a loader part 1, a transfer cassette 7 is carried in through a carry-in opening 11, and a plurality of substrates taken out of the cassette 7 are submerged in a washing liquid in a process vessel provided at a surface processing part 2 for surface treatment. During the surface treatment, the vacant cassette 7 is allowed to wait at a cassette buffer part 5, while the cassette 7 in which a processed substrate is housed is carried out through a carry-out opening 34 comprising a shutter which opens only for carrying out of a substrate surface processing device, at an unloader part 3. During the sequence, the loader part 1, unloader part 3, surface processing part 2, and cassette buffer part 5 are confined in a housing. |
