| 摘要 |
PROBLEM TO BE SOLVED: To embody a proximity exposure method capable of projecting mask patterns to a prescribed region of a work even if light is made incident on a mask diagonally. SOLUTION: The work W is arranged on the mask M, on which the mask patterns are formed apart a prescribed gap disposed therefrom. The work W is irradiated with light diagonally from a lamp house 3 via the mask M to exposure the mask patterns onto the work W. A controller 10 calculates the misalignment quantity between the projection position of the mask patterns on the work W when the mask M is perpendicularly irradiated with the light and the projection position of the mask patterns on the work W when the mask M is irradiated diagonally with the light in accordance with the incident angleδof the light to the mask M, the irradiation angleϕof the light to the mask M and the gap quantity G between the mask M and the work W. The controller executes the alignment of the mask M and the work W in accordance with the calculated misalignment quantity and exposes the mask patterns onto the work W. |
