| 摘要 |
PROBLEM TO BE SOLVED: To prevent the occurrence of a water mark in a substrate by a method wherein, while the substrate is exposed from pure water and/or after exposed, a mist of a water-soluble organic solvent is supplied to the substrate. SOLUTION: A substrate W is dipped in pure water 68 received in a treatment bath 10 to clean the substrate W with water, and if the water cleaning treatment is ended, the substrate W is slowly pulled up from the pure water 68 in the treatment bath 10 by a lifter 30. Opening and closing control valves 52, 76, 80 are opened and also opening and closing control valves 64, 66, 82 are closed, and nitrogen gas and isopropyl alcohol (IPA, fluid) are supplied to a 2-fluid atomizing nozzle 70, and from an atomizing port of the 2-fluid atomizing nozzle 70 toward water face of the pure water 68 in the treatment bath 10, a mist of the IPA which is made foggy with an atomizing pressure of nitrogen gas is atomized together with the nitrogen gas. By this operation, the pure water is replaced completely with the IPA at a vapor-liquid interface on a face of the substrate W.
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