发明名称 MASS FLOW CONTROLLER, FLOW RATE CONTROL METHOD, LIQUID- PHASE MATERIAL EVAPORATION AND SUPPLY DEVICE AND THIN FILM FORMATION APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a mass flow controller whose temperature control is easy and whose reliability is high. SOLUTION: In this mass flow controller 1, a control device 11 by which a control signal used to make a liquid-phase material 17 flow out at a prescribed flow rate is supplied to a flow rate control valve 10 is provided, and the flow rate control valve 10 which can control a flow rate by providing a liquid drop output structure used to output the flowing-into liquid-phase material 17 as a liquid drop is provided. Then, while the number of liquid drops which are outputted at one time or their flow rate is adjusted, the flow rate is controlled.
申请公布号 JP2000121400(A) 申请公布日期 2000.04.28
申请号 JP19980292458 申请日期 1998.10.14
申请人 SEIKO EPSON CORP 发明人 YUDASAKA KAZUO
分类号 G01F1/00;C23C14/54;C23C16/44;C23C16/448;(IPC1-7):G01F1/00 主分类号 G01F1/00
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