发明名称 SLURRIES OF ABRASIVE INORGANIC OXIDE PARTICLES AND METHOD FOR ADJUSTING THE ABRASIVENESS OF THE PARTICLES
摘要 <p>Autoclaving slurries of porous, inorganic oxide particles results in an increased abrasiveness of the particles as reflected in increased removal rates of a polished substrate at standard polishing conditions in chemical mechanical polishing operations. Slurries having novel abrasion properties, especially for silica-based slurries, are created. The increase in particle abrasivity strongly correlates with a decrease in particle surface area as determined by N2 adsorption (BET method). As a result, methods for obtaining a desired abrasivity for a slurry can be practiced by heating a slurry of inorganic oxide particles to a BET surface area previously identified as associated with the abrasivity desired. The resulting slurries can be used in conventional polishing machinery. The method is particularly suitable for preparing silica-based abrasive slurries.</p>
申请公布号 WO2000023534(A1) 申请公布日期 2000.04.27
申请号 US1999024699 申请日期 1999.10.21
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