发明名称 |
Low stress polysilicon film and method for producing same |
摘要 |
Multi-layer assemblies of polysilicon thin films having predetermined stress characteristics and techniques for forming such assemblies are disclosed. In particular, a multi-layer assembly of polysilicon thin film may be produced that has a stress level of zero, or substantially so. The multi-layer assemblies comprise at least one constituent thin film having a tensile stress and at least one constituent thin film having a compressive stress. The thin films forming the multi-layer assemblies may be disposed immediately adjacent to one another without the use of intermediate layers between the thin films. |
申请公布号 |
AU6505399(A) |
申请公布日期 |
2000.04.26 |
申请号 |
AU19990065053 |
申请日期 |
1999.10.04 |
申请人 |
CASE WESTERN RESERVE UNIVERSITY |
发明人 |
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分类号 |
C23C16/24;C23C16/44;C23C28/02;H01L21/205;H01L21/285 |
主分类号 |
C23C16/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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