Method of making inverted merged MR head with track width defining first pole tip component constructed on a side wall

摘要

A method of making provides an inverted merged MR head wherein frame plating is not required for forming a highly defined submicron track width of a top first pole tip portion. A forming structure is formed on a bottom first pole tip portion with a vertical wall located at a site where one of the edges of the top first pole tip is to be located. The top first pole tip is sputtered or plated on the vertical wall of the forming structure with a thickness that defines the track width of the write head. A mask with a recessed portion may be employed for forming the top first pole tip with a back wall that defines a zero throat height of the head. In a preferred embodiment a forming layer is formed adjacent an opposite edge of the top first pole tip and then the top surfaces of the top first pole tip, the forming layer and the forming structure are lapped until these top surfaces are flush with one another. The material of the top first pole tip has an ion milling rate that is greater than the ion milling rates of the forming layer and the forming structure. Ion milling is then employed to ion mill the top of the top first pole tip at a greater rate than the other layers causing a recess which is centered above the top surface of the top first pole tip. After depositing a write gap layer and a seedlayer in the recess the second pole tip is deposited in the recess causing the base of the second pole tip to be substantially aligned with the top surface of the top first pole tip. Sloping surfaces extending from the base of the second pole tip are similar to notching of a first pole piece in the prior art which promotes flux transfer between the pole tips and minimizes stray flux from the second pole tip to the bottom first pole tip.