| 摘要 |
PROBLEM TO BE SOLVED: To prevent the deformation of a substrate of an optical information recording medium in the case of sputtering film formation, to eliminate various problems caused by the deformation and to enable the production of an optical information recording medium, particularly that as for high speed continuous film formation, thick film formation and film formation onto a thin disk substrate. SOLUTION: This sputtering device is the one in which the central part and the outer circumferential part of the object 4 to be treated are masked with a center mask member 2 and an outer circumferential mask member 3 respectively, moreover, a part of the central part and outer circumference of the object to be treated is pressed against the center and outer circumferential mask members by a pusher 15, and film formation is executed to the place other than the masking place in the object to be treated by sputtering. In this case, as the pusher, the one in which, at the time of pressing the object 4 to be treated against masks, the total width W in the circumferential direction in the part free from the presence of projections 14 holding the outer circumferential part of the object 4 to be treated satisfies W<0.05L in the case where the outer circumference of the pusher is defined as L(18) is provided for the device.
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