POSITIVE RESIST COMPOSITION

摘要

PURPOSE: A positive resist composition is structured to improve the decomposition performance and sensitivity when it is exposed to light having a wave less than 220 nm and to have high dry-etching resistance and adhesive property with respect to a board. CONSTITUTION: A positive resist composition includes a compound for generating acid with respect to radiation or other chemical radiation and a resin decomposed by a reaction with the acid so that solubility can be increased within a developing solution. The resin has a cross-linkage structure and a multi-link type radical. The cross-linkage structure is an acid composition acetyl ester structure which can be decomposed by the acid. The composition may further include an acid decomposition solution-preventing compound having a molecular weight less than 3,000. The acid decomposition solution-preventing compound has a radical that can be decomposed by a reaction with the acid and increased in solubility within an alkali developing solution.