发明名称 METHOD AND APPARATUS FOR LIQUID PHASE EPITAXIAL GROWTH
摘要 PROBLEM TO BE SOLVED: To prevent a scattered component from mixing into an adjoining solution container of a raw material and substrate holder, and from attaching to a substrate, when carrying out the liquid phase epitaxial growing of a compound semiconductor comprising easily scattered components such as GaInP and AlGaInP. SOLUTION: An epitaxial layer of a compound semiconductor containing a volatile constituent such as phosphorus is grown on a substrate 7 by allowing a raw material solution holder 3 which has raw material solution containers 11a, 11b and 11c, to face to a substrate holder 2, using a growing apparatus enabling relatively slidable movement while cooling the substrate 7 from a prescribed temperature, and bringing the substrate 7 into contact with a raw material solution 5 for growth. A cap holder 4 is put lid on the upper surface on the other side of the sliding face of the raw material solution holder 3 to prevent the evaporation and the dispersion of the volatile constituent. Grooves 6 and 8 are formed at a sliding face of the substrate holder 2 and the raw material solution holder 3 or the contacting face of the lid and the raw material solution holder 3. The gas volatilized from the raw material solution is introduced to the grooves 6 and 8, and discharged to the outside.
申请公布号 JP2000119094(A) 申请公布日期 2000.04.25
申请号 JP19980289259 申请日期 1998.10.12
申请人 HITACHI CABLE LTD 发明人 KONNO TAIICHIRO;UNNO TSUNEHIRO;SHIBATA MASATOMO
分类号 C30B19/00;C30B19/06;C30B29/40;H01L21/208;H01L33/30 主分类号 C30B19/00
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