发明名称 PLASMA WASHING METHOD AND DEVICE
摘要 PROBLEM TO BE SOLVED: To effectively enable washing a place to be washed only by feeding reaction gas and high frequency power to a plasma irradiating nozzle to gener ate plasma from the head thereof and irradiating the generated plasma to the part to be washed of an object. SOLUTION: At the time of washing an electrode 12a or the like of a substrate 12 to remove organic matter or the like, after the substrate 12 is moved to near a substrate holding device 22 in the X direction by a substrate bring-in device 21, it is transferred to the substrate holding device 22 by a substrate transfer device. The substrate 12 positioned in the X direction and in the Y direction in the substrate holding device 22 is moved reciprocating in the X direction and in the Y direction by a X direction transfer device 24 and a Y direction transfer device 23 respectively to position the electrode 12a of the substrate 12 below the plasma irradiating nozzle 1. Reaction gas and high frequency power are fed to the plasma irradiating nozzle 1 to generate plasma 6 from the head thereof, and the generated plasma 6 is irradiated to the electrode 12a part to be washed to wash the electrode 12a.
申请公布号 JP2000117213(A) 申请公布日期 2000.04.25
申请号 JP19980290648 申请日期 1998.10.13
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 NISHINO KENICHI;MAYAHARA KIYOSHI;IDA MASAYUKI;TSUJI SHINJIRO;NISHIMOTO TOMOTAKA
分类号 B08B7/00;(IPC1-7):B08B7/00 主分类号 B08B7/00
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