发明名称 EVAPORATOR FOR VACUUM DEPOSITION FACILITY
摘要 PURPOSE: Evaporator for vacuum deposition facility change evaporation rate quickly, maintain for long process time without stopping moving of facility by minimizing pollution of evaporated metal. CONSTITUTION: Evaporator for vacuum deposition facility comprises: vaporizer(3) is heated with electric heater by fitting up crucible to evaporate inputted metal; tubular nozzle head(1) with hollow body is formed with nozzle(2) to discharge metal vapor on cylindrical jacket surface. And said vaporizer(3) have vaporizer casing(4) to form crucible by binding to nozzle head(1).
申请公布号 KR20000022893(A) 申请公布日期 2000.04.25
申请号 KR19990037252 申请日期 1999.09.03
申请人 LEYBOLD SYSTEMS GMBH 发明人 KLEMM GUNTER;NEUDERT HANS;ACHTNER WOLFGANG
分类号 C23C14/24;(IPC1-7):C23C14/24 主分类号 C23C14/24
代理机构 代理人
主权项
地址