发明名称 |
ION GAUGE OF PROCESS CHAMBER |
摘要 |
PURPOSE: An ion gauge of a process chamber is provided to prevent broken pieces of wafer or particles from coming into a tube of the ion gauge and therefore lengthen the lifetime of the ion gauge. CONSTITUTION: An ion gauge for measuring a degree of vacuum in a vacuum chamber a filter disposed in a connector for connecting the vacuum chamber and the ion gauge. The filter blocks broken pieces of wafer particles.
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申请公布号 |
KR20000021474(A) |
申请公布日期 |
2000.04.25 |
申请号 |
KR19980040572 |
申请日期 |
1998.09.29 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
BAE, GWANG HO |
分类号 |
H01L21/00;(IPC1-7):H01L21/00 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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