发明名称 ION GAUGE OF PROCESS CHAMBER
摘要 PURPOSE: An ion gauge of a process chamber is provided to prevent broken pieces of wafer or particles from coming into a tube of the ion gauge and therefore lengthen the lifetime of the ion gauge. CONSTITUTION: An ion gauge for measuring a degree of vacuum in a vacuum chamber a filter disposed in a connector for connecting the vacuum chamber and the ion gauge. The filter blocks broken pieces of wafer particles.
申请公布号 KR20000021474(A) 申请公布日期 2000.04.25
申请号 KR19980040572 申请日期 1998.09.29
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 BAE, GWANG HO
分类号 H01L21/00;(IPC1-7):H01L21/00 主分类号 H01L21/00
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